Metallum etchingEst ars ad remotionem materiae usura eget reactionem aut corporalis impulsum. Metallum Etching technology potest dividitur in duo genera: infectum etching et sicca etching. Metallum Etching est composito ex serie complexu chemical processus, et diversis corrosives diversis corrosio proprietatibus et vires pro diversis metallum materiae.
Metallum etchingis usually referred to as photochemical etching, which refers to the removal of the protective film of the metal etching area after exposure, plate making and development, and contact with chemical solutions during metal etching to achieve the effect of dissolving and corroding, forming bumps or hollows The effect of molding. Hoc est primum solebat fabricare aeris laminam, cadmiae laminam et alias excudendi concavum et convexa laminis, et late in processus pondus reductionem instrumenti tabulata, nameplates et tenues modi, quod difficile ad processum per traditional processus modi Postquam continua emendationem et processus apparatu progressionem, quod potest etiam esse in processus of praecisione metallum etching products of electronic tenues partes in aviation, machinatione et eget industria. Praesertim in semiconductor vestibulum processus, metallum etching est necessaria technology.
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